FFKM materials are known for their exceptional resistance to extreme temperatures, harsh chemicals and aggressive plasma environments, making them ideal for use in critical semiconductor manufacturing processes. From sealing application in semiconductor equipment to wafer handing, FFKM materials offer unmatched performance, ensuring integrity of processes and minimizing downtime due to material failure.
Sealing solutions show key qualities such as low plasma erosion rates, high temperature stability, excellent resistance to various chemical processes (dry and wet), and exceptional sealing performance. Additionally, to maintain product purity, all FFKM seals are manufactured and packaged in a cleanroom environment.
We manufacture sealing solutions for:
To withstand aggressive plasma conditions, seals need to have high purity, low particle generation and low outgassing to guarantee reliability and long-life.
Thermal based applications require high-performance materials to give long term sealing resistance at high temperatures, together with specific chemical resistance.
Wet chemistry is widely used in the processing of wafers, requiring high resistance to specific chemicals, without contributing to organic or metallic contamination of the stripping or cleaning fluids.
Characterised by a broad service temperature range from -46 °C to 340 °C, evolast® compounds exhibit remarkable resistance to aggressive chemicals, such as acids, organic and inorganic fluids, ketones, esters, solvents, amines, as well as hot water and steam.
Special compounds for explosive decompression (AED/RGD) ensure reliable performance in extreme conditions. Working within temperature ranges from -60 °C to 250 °C, these materials exhibit good physical properties and excellent chemical resistance.
Don't hesitate to contact us for any further request.